鄭錫恩

經歷

服務機關	職稱	起迄年月
南台科技大學	助理教授 / 副教授 / 教授 /系主任	2000 / 08 至迄今
南亞科技（股）公司	製程資深工程師 / 課經理	1997 / 11 至 2000 / 07
棨驊工業（股）公司	總經理室 - 特別助理	1996 / 04 至 1997 / 10
林陽玻璃（股）公司	濺鍍課研發工程師	1991 / 04 至 1992 / 07

獲獎榮譽

1. 2011 國際奈米研討會海報論文佳作獎二篇

2. 2010 南台科大國科會特殊優秀人才獎

3. 2010 南台科大第十三屆學生專題競賽特優獎指導老師

4. 2008 年材料年會海報論文佳作獎一篇

5. 2006 台灣鍍膜協會年會論文優等獎一篇

6. 2006 績優導師

期刊論文

2011	Hsyi-En Cheng, Yu-Ru Chen, Wen-Tuan Wu, Ching-Ming Hsu,Effect of nitrogen doping concentration on the properties of TiO2 films grown by atomic layer deposition,Materials Science and Engineering Bvol.176,no.7,pp596–599,2011
2011	Chien-Min Liu, Chih Chen, Hsyi-En Cheng,Ultraviolet Photoresponse of TiO2 Nanotube Arrays Fabricated by Atomic Layer Deposition,Electrochemical and Solid-State Lettersvol.14,no.6,ppK33-K35,2011
2011	Chien-Min Liu, Chih Chen, Hsyi-En Cheng,Growth Mechanism of TiO2 Nanotube Arrays in Nanopores of Anodic Aluminum Oxide on Si Substrates by Atomic Layer Deposition,Journal of the Electrochemical Societyvol.158,no.3,ppK58-K63,2011
2010	鄭錫恩、郭彥良、邱南榮,以核殼奈米柱結構提升氮摻雜二氧化鈦薄膜之光電響應,真空科技vol.23,no.2,pp45-50,2010
2010	Yung-Huang Chang, Chien-Min Liu, Yuan-Chieh Tseng, Chih Chen, Chia-Chuan Chen and Hsyi-En Cheng,Direct probe of heterojunction effects upon photoconductive properties of TiO2 nanotubes fabricated by atomic layer deposition,Nanotechnologyvol.22,no.21,pp225602-22568,2010
2010	Wen-Tuan Wu, Chia-Jen Chang, Hsyi-En Cheng, Ching-Ming Hsu, Kun-San Tsen,Continuous cell air-extracting technique used for fast cell filling of flexible liquid-crystal displays,J. Vac. Sci. Technol. Bvol.28,no.4,pp673-677,2010
2010	Hsyi-En Cheng, S. H. Hsiao, Deng-Maw Lu,Enhancement of photoelectrochemical properties of ALD TiO2 films by light-trapping effect,Electrochemical and Solid-State Lettersvol.13,no.5,ppD19-D22,2010
2009	Hsyi-En Cheng, Chung-Ho Lai, Chien-Lung Huang,Properties of ITO transparent conducting films grown by sputtering at room temperature,南台科技大學學報vol.34,no.4,pp11-15,2009
2009	Hsyi-En Cheng, Ching-Ming Hsu, and Yi-Chih Chen,Substrate Materials and Deposition Temperature Dependent Growth Characteristics and Photocatalytic Properties of ALD TiO2 Films,JOURNAL OF ELECTROCHEMICAL SOCIETYvol.156,no.8,ppD275-D278,2009
2009	Hsyi-En Cheng*, Meng-Rong Lee, Yu-Hung Hsieh, Ching-Ming Hsu,Atomic Layer Deposition of Nitrogen-Doped Titanium Dioxide Films Using Titanium Chloride and Ammonia Water as the Precursors,Journal of the Australian Ceramic Societyvol.45,no.2,pp64-68,2009
2009	Ching-Ming Hsu, Chieh-Yang Huang, Hsyi-En Cheng, Wen-Tuan Wu,Flexible organic light-emitting diodes consisting of a platinum doped indium tin oxide anode,JOURNAL OF PHYSICS D-APPLIED PHYSICSvol.42,no.10,pp105301,2009
2008	Tien-Chai Lin, Hsyi-En Cheng, Shih-Hung Tang, Wu-Chien Liu, Antony H.C. Lee,The characteristics and residual stress of aluminum nitride films grown by two-stage sputtering of mid-frequency power,Materials Science and Engineering Avol.480,no.1-2,pp226-231,2008
2008	Tien-Chai Lin, Hsyi-En Cheng, Shih-Hung Tang, Wu-Chien Liu, Antony H.C. Lee,The characteristics and residual stress of aluminum nitride films grown by two-stage sputtering of mid-frequency power ,Materials Science and Engineering A ,vol.480 ,no.n1-2 ,pp.226–231 ,2008
2008	M.-J. Chiang, C.-W. Wu, H.-E. Cheng,Effect of oxygen flow rate and temperature on the structure of DC sputtered nanocyrtsalline copper oxide films,Advanced Materials Researchvol.31,no.,pp129-131,2008
2008	Hsyi-En Chenga and Chia-Chuan Chen,Morphological and photoelectrochemical properties of ALD TiO2 films ,Journal of The Electrochemical Society ,vol.155 ,no.9 ,pp.D604-D607 ,2008
2008	Hsyi-En Cheng, Wen-Jen Lee, Ching-Ming Hsu, Ming-Hsiung Hon, Chien-Lung Huang,Visible light activity of nitrogen-doped TiO2 thin films grown by atomic layer deposition,Electrochemical and Solid-State Lettersvol.11,no.10,ppD81-D84,2008
2008	Hsyi-En Cheng, Wen-Jen Lee, Ching-Ming Hsu, Ming-Hsiung Hon, Chien-Lung Huang,Visible light activity of nitrogen-doped TiO2 thin films grown by atomic layer deposition ,Electrochemical and Solid-State Letters ,vol.11 ,no.10 ,pp.D81-D84 ,2008
2008	Hsyi-En Cheng, Chia-Chuan Chen,Morphological and photoelectrochemical properties of ALD TiO2 films,Journal of The Electrochemical Societyvol.155,no.9,ppD604-D607,2008
2006	Hsyi-En Cheng, Chien-Tang Mao,In-situ substrate heating and postdeposition annealing on the compositions and electrical properties of tantalum oxide thin films grown by reactive sputtering ,Japanese Journal of Applied Physics ,vol.45 ,no.1A ,pp.160-164 ,2006
2006	Hsyi-En Cheng, and Wen-Jen Lee,Properties of TiN films grown by atomic-layer chemical vapor deposition with a modified gaseous-pulse sequence ,Materials Chemistry & Physics ,vol.97 ,pp.315-320 ,2006
2006	Hsu CM, Liu CF, Cheng HE, Wu WT,Low-temperature nickel-doped indium tin oxide anode for flexible organic light-emitting devices ,Journal of Electronic Materials ,vol.35 ,pp.383-387 ,2006
2005	Hsyi-En Cheng, Wen-Jen Lee, C.-M. Hsu,The effect of deposition temperature on the properties of TiN diffusion barriers prepared by atomic layer chemical vapor deposition ,Thin Solid Films ,vol.485 ,no.1-2 ,pp.59-65 ,2005
2005	Chien-Hsin Yang, Yi-Kai Chih, Hsyi-En Cheng, and Cheng-Ho Chen,Nanofibers of self-doped polyaniline ,Polymer ,vol.46 ,no.24 ,pp.10688-10698 ,2005
2004	Hsyi-En Cheng, Yao-Wei Wen,Correlation between process parameters, microstructure and hardness of TiN films by chemical vapor deposition ,Surface & Coatings Technology ,vol.179 ,no.1 ,pp.103-109 ,2004
2003	Hsyi-En Cheng, Tien-Chai Lin, and Wen-Chien Chen,Preparation of [0 0 2] oriented AlN thin films by mid frequency reactive sputtering technique ,Thin Solid Films ,vol.425 ,no.1-2 ,pp.85-89 ,2003
2003	Hsyi-En Cheng, Chien-Tang Mao,The effect of substrate temperature on the physical properties of tantalum oxide thin films grown by reactive radio-frequency sputtering ,Materials Research Bulletin ,vol.38 ,no.14 ,pp.1841-1849 ,2003
1996	Hsyi-En Cheng, Tain-Tsair Lin, Min-Hsiung Hon,Multiple twins induced [110] preferred growth in TiN and SiC films prepared by CVD ,Scripta Materialia ,vol.35 no.1 ,pp.113-116 ,1996
1996	Hsyi-En Cheng, Min-Hsiung Hon,Texture formation in titanium nitride films prepared by chemical vapor deposition ,Journal of Applied Physics ,vol.79 ,no.10 ,pp.8047-8053 ,1996
1996	Hsyi-En Cheng, Min-Hsiung Hon,Influence of TiN coating thickness on the wear of Si3N4-based cutting tools ,Surface & Coatings Technology ,vol.81 ,no.2-3 ,pp.256-261 ,1996
1995	Hsyi-En Cheng, Min-Hsiung Hon,Growth Characteristics and Properties of TiN Coating by Chemical Vapor Deposition ,Journal of the Electrochemical Society ,vol.142 ,no.5 ,pp.1573-1578 ,1995
1994	Hsyi-En Cheng, Min-Hsiung Hon,Growth mechanism of star-shaped TiN crystals ,Journal of Crystal Growth ,vol.142 ,no.1-2 ,pp.117-123 ,1994

研討會論文

2010	鄭錫恩、林淑、鎳奈米柱金屬電極之製備,第五屆全國氫能與燃料電池學術研討會
2010	Kuan-Chun Huang, Hsyi-En Cheng,The characteristics of SnO2 films grown by atomic layer deposition,International Conference on Optics and Photonics in Taiwan>
2010	Hsyi-En Cheng , Yu-Chi Yang,Fabrication of flexible TiO2nanopillar photoelectrode,The 9th International Symposium on Advanced Technology (ISAT 9)
2009	Hsyi-En Cheng and Yu-Ru Chen,Effect of NH3-to-H2O injection ratio on the properties of atomic layer deposited N-doped TiO2 films,TACT 2009 International Thin Films Conference
2009	B.J. Yeh, H. E. Cheng, Y.H. Hsieh,Fabrication of nanoporous copper films by selective dealloying of Cu-Fe alloy,2009 International symposium on nanoscience and technology
2009	Chun-Te Lee, Hsyi-En Cheng,Enhancement of photocurrent response of N-doped TiO2 films by using a porous underlayer,8th International Symposium on Advanced Technology
2008	陳羿志，陳家全，鄭錫恩，謝煜弘，基材種類對原子層沉積 TiO2膜性質之影響,2008台灣鍍膜科技年會
2008	章詠湟，陳智，鄭錫恩，陳家全,運用原子層沉積系統成長二氧化鈦奈米管之光檢測器應用,2008年材料年會
2008	Y.-R. Chen, H. E. Cheng, Y.-H. Hsieh,Effect of argon purge amonut on the photoelectrochemical properties of nitrogen-doped tio2 films grown by atomic layer deposition,2008 International symposium on nanoscience and technology
2003	譚立威,湯士弘,鄭錫恩, "電漿輔助蒸著有機發光元件保護膜之抗水氣滲透特性研究", 2003年鍍膜年會, 論文編號：G11.
2003	湯士弘,鄭錫恩,林天財, "氮化鋁薄膜體聲波振盪器之模擬研究", 2003年鍍膜年會, 論文編號：D08.
2003	Hsyi-En Cheng, Chien-Tang Mao, "The structure and breakdown voltage of tantalum oxide thin films grown by reactive sputtering", International symposium on nano science and technology, Tainan, Taiwan, 4-7 November 2003, p197.
2003	Hsyi-En Cheng, Wen-Jen Lee, "The characteristics of TiN films grown by atomic layer chemical vapor deposition", International symposium on nano science and technology, Tainan, Taiwan, 4-7 November 2003, p56.
2003	鄭錫恩、李文仁、毛健棠, "即時退火與沉積後退火對反應濺鍍氧化鉭薄膜結構與電性之影響", 2003年材料年會, .半導體材料.
2003	鄭錫恩、李文仁, "以原子層化學氣相沉積法製備氮化鈦薄膜特性研究", 2003年電子元件暨材料研討會, pp.13-16.
2002	林天財, 鄭錫恩, 陳文建,劉伍健, "以中頻濺射成長高優選取向AlN薄膜技術之研發", 2002年鍍膜年會, pp.399-402.
2002	毛健棠, 鄭錫恩, 陳文建, 劉伍健, 林天財, "AlN成長於LiNbO3基板之表面聲波元件特性研究", 2002年材料年會, G.半導體材料.

產學合作

2011	顛覆傳統PU泡棉之環保透氣床墊與椅墊開發評估
2011	100年度補助技專校院建立特色典範計畫－綠能智慧電動車研發暨人才培育計畫－子計畫3　綠能與照明技術
2011	100學年度「產學攜手合作計畫」
2007	斜向濺鍍具特徵形貌氧化銦錫(ITO)之微結構與成長特性研究

國科會計劃

2010	二氧化錫/二氧化鈦核殼奈米管柱之製備及其應用於染料敏化太陽能電池之研究
2009	原子層沉積高比表面積、高效能TiO2-xNx太陽能製氫電極之開發(3/3)
2008	原子層沉積高比表面積、高效能TiO2-xNx太陽能製氫電極之開發(2/3)
2007	原子層沉積高比表面積、高效能TiO2-xNx太陽能製氫電極之開發
2007	斜向濺鍍具特徵形貌氧化銦錫(ITO)之微結構與成長特性研究
2006	原子層沉積氮摻雜二氧化鈦薄膜之微結構、能隙及光電流特性研究
2005	原子層沉積二氧化鈦半導體光觸媒及其在可見光效率提升之研究
2004	原子層化學氣相沉積次90奈米銅導線金屬擴散阻障層之研究
2003	原子層化學氣相沉積氮化鈦薄膜之成長特性與性質研究
2002	有機電激發光裝置之封裝開發
2002	電漿輔助蒸著有機發光元件多層保護膜之抗水/氧滲透特性研究

指導碩士班論文

2010	原子層沉積二氧化錫薄膜特性研究黃冠竣
2009	Ni-TiO2核殼奈米柱陣列之製備及其光電化學特性研究葉柏均
2009	模板輔助原子層沉積奈米結構二氧化鈦之光觸媒特性研究陳羿志
2009	以多孔性底材提升二氧化鈦光電響應之研究李俊德
2008	原子層沉積氮摻雜二氧化鈦薄膜之光電化學特性研究陳宥儒
2006	原子層沉積氮摻雜二氧化鈦薄膜之特性研究李孟融
2005	原子層沉積二氧化鈦薄膜光觸媒之特性研究黃群勝
2005	反應濺鍍純二氧化鈦與氮摻雜二氧化鈦之薄膜特性研究杜怡昶
2004	以原子層化學氣相沉積法成長氮化鈦薄膜之特性研究李文仁
2004	兩階段磁控濺鍍法成長氮化鋁壓電薄膜之研究湯士弘
2004	反應性濺鍍氧化鉭與氧化鉿薄膜特性之研究譚立威
2003	即時退火與沉積後退火對反應濺鍍氧化鉭薄膜物理性質之影響研究毛健棠
2003	反應性射頻磁控濺鍍法成長矽化物有機發光元件透明保護膜之研究文耀葦
2002	以中頻反應性磁控濺射法成長[002]優選取向氮化鋁薄膜之研究陳文建

大學部專題

2008	以不同金屬基版與應用與染料敏化太陽能電池黃冠竣,林耿民
2008	反應性磁控濺鍍摻雜鎵(Ga)之氧化鋅(ZnO)薄膜光電特性研究張嘉容,楊育綺
2008	以陽極氧化呂模板製備鎳奈米柱研究林佑聰,陳逸凡
2006	濺鍍製成參數對三氧化鎢薄膜成長及光響應特性之影響許展榮/林坦蔚
2006	兩階段成長微米級厚度多晶矽薄膜之研究李欣達
2006	原子層沉積二氧化鈦薄膜之顯微結構分析李慶峰/周盈慧
2002	OLED防護層透水性實驗林金標/李慶禧